Invention Application
US20130250293A1 Method and Apparatus for Actively Monitoring an Inductively-Coupled Plasma Ion Source using an Optical Spectrometer
审中-公开
使用光谱仪来积极监测电感耦合等离子体离子源的方法和装置
- Patent Title: Method and Apparatus for Actively Monitoring an Inductively-Coupled Plasma Ion Source using an Optical Spectrometer
- Patent Title (中): 使用光谱仪来积极监测电感耦合等离子体离子源的方法和装置
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Application No.: US13424977Application Date: 2012-03-20
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Publication No.: US20130250293A1Publication Date: 2013-09-26
- Inventor: Mark W. Utlaut , Sean Kellogg , N. William Parker , Anthony Graupera , Shouyin Zhang , Philip Brundage , Doug Kinion
- Applicant: Mark W. Utlaut , Sean Kellogg , N. William Parker , Anthony Graupera , Shouyin Zhang , Philip Brundage , Doug Kinion
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Main IPC: G01J3/443
- IPC: G01J3/443
Abstract:
A method and apparatus for actively monitoring conditions of a plasma source for adjustment and control of the source and to detect the presence of unwanted contaminant species in a plasma reaction chamber. Preferred embodiments include a spectrometer used to quantify components of the plasma. A system controller is provided that uses feedback loops based on spectral analysis of the plasma to regulate the ion composition of the plasma source. The system also provides endpointing means based on spectral analysis to determine when cleaning of the plasma source is completed.
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