Invention Application
US20150323408A1 REFERENCE LEAK GENERATING DEVICE AND ULTRA-FINE LEAK TESTING DEVICE USING SAME
审中-公开
参考泄漏发生装置和使用相同的超微细泄漏测试装置
- Patent Title: REFERENCE LEAK GENERATING DEVICE AND ULTRA-FINE LEAK TESTING DEVICE USING SAME
- Patent Title (中): 参考泄漏发生装置和使用相同的超微细泄漏测试装置
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Application No.: US14443904Application Date: 2013-11-12
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Publication No.: US20150323408A1Publication Date: 2015-11-12
- Inventor: Hajime YOSHIDA , Kenta ARAI , Tokihiko KOBATA
- Applicant: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Applicant Address: JP Tokyo
- Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee: NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY
- Current Assignee Address: JP Tokyo
- Priority: JP2012-254849 20121121
- International Application: PCT/JP2013/080551 WO 20131112
- Main IPC: G01L27/00
- IPC: G01L27/00 ; G01M3/26 ; B81B7/00

Abstract:
There is provided a reference leak generating device capable of precisely generating an ultra-fine reference leak. The reference leak generating device adapted to be connected to an upstream side of a measurement chamber includes a chamber connected to the measurement chamber through an orifice or a porous plug having a molecular flow conductance C and a pressure to establish molecular flow conditions which are known in advance, and is characterized in that a pressure p1 of testing gas to be introduced into the chamber is precisely determined by using a static expansion method once or more times, and a leak rate of a reference leak at the pressure p1 is obtained in accordance with a product of C and p1.
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