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公开(公告)号：US20180038758A1
公开(公告)日：2018-02-08
申请号：US15723752
申请日：2017-10-03
Inventor： Hajime YOSHIDA , Kenta ARAI , Tokihiko KOBATA
CPC classification number: G01L27/002 , B81B7/0009 , B81B2201/05 , G01M3/007 , G01M3/207 , G01M3/26
Abstract: A static expansion method is performed by expanding a volume of a testing gas from V0 to V0+V1 between a second chamber of the volume V1 which is connected to an upstream side of a measurement chamber and a first chamber of the volume V0 which is connected to an upstream side of the second chamber, wherein the first camber is in communication with the second chamber via a first valve, wherein the second chamber is in communication with the measurement chamber via each of a second valve and an orifice or porous plug, respectively. When the first valve is opened and the second valve is closed, the testing gas flows from the first chamber via the second chamber into the measurement chamber only through the orifice or porous plug.
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2.发明申请REFERENCE LEAK GENERATING DEVICE AND ULTRA-FINE LEAK TESTING DEVICE USING SAME 审中-公开参考泄漏发生装置和使用相同的超微细泄漏测试装置公开(公告)号：US20150323408A1
公开(公告)日：2015-11-12
申请号：US14443904
申请日：2013-11-12
Inventor： Hajime YOSHIDA , Kenta ARAI , Tokihiko KOBATA
CPC classification number: G01L27/002 , B81B7/0009 , B81B2201/05 , G01M3/007 , G01M3/207 , G01M3/26
Abstract: There is provided a reference leak generating device capable of precisely generating an ultra-fine reference leak. The reference leak generating device adapted to be connected to an upstream side of a measurement chamber includes a chamber connected to the measurement chamber through an orifice or a porous plug having a molecular flow conductance C and a pressure to establish molecular flow conditions which are known in advance, and is characterized in that a pressure p1 of testing gas to be introduced into the chamber is precisely determined by using a static expansion method once or more times, and a leak rate of a reference leak at the pressure p1 is obtained in accordance with a product of C and p1.
Abstract translation: 提供了能够精确地产生超细参考泄漏的参考泄漏产生装置。 适于连接到测量室的上游侧的参考泄漏产生装置包括通过具有分子流导度C和压力的孔口或多孔塞连接到测量室的室，以建立分子流动条件 并且其特征在于，通过使用静态膨胀法一次或多次精确地确定要引入到室中的测试气体的压力p1，并且根据压力p1获得压力p1处的基准泄漏的泄漏率 C和p1的产物。
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公开(公告)号：US20220349735A1
公开(公告)日：2022-11-03
申请号：US17764304
申请日：2020-10-16
Inventor： Hajime YOSHIDA , Yoshinori TAKEI , Kenta ARAI , Mao HIRATA , Tsutomu HARA , Jun INOMATA
Abstract: A flow rate of a gas is determined based on a predetermined relational expression including, as parameters: the flow rate of the gas; diameter and length of a hole; upstream and downstream pressures; and temperature, molecular weight, viscosity coefficient, and specific heat ratio of the gas. Additionally, setting conditions for a type and temperature of the gas, the length of the hole, and the pressures upstream and downstream from the hole are set; the relational expression is used to obtain the correspondence relationship between the diameter of the hole and the flow rate of the gas flowing through the hole; an approximation function approximating the obtained correspondence relationship is determined; the flow rate of a gas passing through a test piece having a hole of an unknown diameter is measured; and the diameter of the hole is estimated, based on the measured flow rate and the approximation function.
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