Invention Application
- Patent Title: OPTICAL AND CHEMICAL ANALYTICAL SYSTEMS AND METHODS
- Patent Title (中): 光学和化学分析系统和方法
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Application No.: US14507637Application Date: 2014-10-06
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Publication No.: US20160069805A1Publication Date: 2016-03-10
- Inventor: Rudy Hofmeister , Scott Tandy , Donald Ice
- Applicant: H2Optx Inc.
- Main IPC: G01N21/64
- IPC: G01N21/64 ; G01J3/44

Abstract:
Optical and chemical analytical systems and methods are provided herein. In one embodiment, a method includes exposing a mixture sample to electromagnetic radiation, the mixture sample including analytes, detecting responsiveness of one or more of the analytes to the electromagnetic radiation, calculating average responsiveness of the one or more of the analytes, and calculating a concentration of the one or more of the analytes in the mixture sample using the average responsiveness.
Public/Granted literature
- US09562862B2 Optical and chemical analytical systems and methods Public/Granted day:2017-02-07
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