Invention Application
US20160089693A1 METHOD FOR COATING A SUBSTRATE WITH A LACQUER AND DEVICE FOR PLANARISING A LACQUER LAYER
审中-公开
用于涂布具有用于计划拉伸层的拉丝器和装置的基板的方法
- Patent Title: METHOD FOR COATING A SUBSTRATE WITH A LACQUER AND DEVICE FOR PLANARISING A LACQUER LAYER
- Patent Title (中): 用于涂布具有用于计划拉伸层的拉丝器和装置的基板的方法
-
Application No.: US14861105Application Date: 2015-09-22
-
Publication No.: US20160089693A1Publication Date: 2016-03-31
- Inventor: Katrin Fischer , Florian Palitschka , Johannes Platen , Kento Kaneko
- Applicant: SUSS MicroTec Lithography GmbH
- Priority: DE102014113928.3 20140925
- Main IPC: B05D3/00
- IPC: B05D3/00 ; B05D1/02
Abstract:
The disclosure relates to a method for coating a substrate with a lacquer. First, the lacquer is uniformly applied to the substrate. Then, the solvent proportion of the lacquer applied to the substrate is reduced, and the coated substrate is exposed to a solvent atmosphere. In some embodiments, the lacquer is heated. The invention also relates to a device for planarising a lacquer layer.
Public/Granted literature
- US10232405B2 Method for coating a substrate with a lacquer and device for planarising a lacquer layer Public/Granted day:2019-03-19
Information query
