Invention Grant
- Patent Title: Method for coating a substrate with a lacquer and device for planarising a lacquer layer
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Application No.: US14861105Application Date: 2015-09-22
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Publication No.: US10232405B2Publication Date: 2019-03-19
- Inventor: Katrin Fischer , Florian Palitschka , Johannes Platen , Kento Kaneko
- Applicant: SUSS MicroTec Lithography GmbH
- Applicant Address: DE Garching
- Assignee: SUSS MICROTEC LITHOGRAPHY GMBH
- Current Assignee: SUSS MICROTEC LITHOGRAPHY GMBH
- Current Assignee Address: DE Garching
- Agency: Hayes Soloway PC
- Priority: DE102014113928 20140925
- Main IPC: B05D3/02
- IPC: B05D3/02 ; B05D3/04 ; B05D3/10 ; B05D5/00 ; B05D7/04 ; B05D7/26 ; G03F7/00
Abstract:
A method for coating a substrate with a lacquer is disclosed. First, the lacquer is uniformly applied to the substrate. Then, the solvent proportion of the lacquer applied to the substrate is reduced, and the coated substrate is exposed to a solvent atmosphere. In some embodiments, the lacquer is heated. The invention also relates to a device for planarizing a lacquer layer.
Public/Granted literature
- US20160089693A1 METHOD FOR COATING A SUBSTRATE WITH A LACQUER AND DEVICE FOR PLANARISING A LACQUER LAYER Public/Granted day:2016-03-31
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