Invention Application
- Patent Title: Semiconductor Structure with Inhomogeneous Regions
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Application No.: US14984156Application Date: 2015-12-30
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Publication No.: US20160118536A1Publication Date: 2016-04-28
- Inventor: Maxim S. Shatalov , Alexander Dobrinsky , Alexander Lunev , Rakesh Jain , Jinwei Yang , Michael Shur , Remigijus Gaska
- Applicant: Sensor Electronic Technology, Inc.
- Applicant Address: US SC Columbia
- Assignee: Sensor Electronic Technology, Inc.
- Current Assignee: Sensor Electronic Technology, Inc.
- Current Assignee Address: US SC Columbia
- Main IPC: H01L33/10
- IPC: H01L33/10 ; H01L33/44 ; H01L33/22 ; H01L33/32 ; H01L33/00 ; H01L33/06

Abstract:
A semiconductor layer including a plurality of inhomogeneous regions is provided. Each inhomogeneous region has one or more attributes that differ from a material forming the semiconductor layer. The inhomogeneous regions can include one or more regions configured based on radiation having a target wavelength. These regions can include transparent and/or reflective regions. The inhomogeneous regions also can include one or more regions having a higher conductivity than a conductivity of the radiation-based regions, e.g., at least ten percent higher. In one embodiment, the semiconductor layer is used to form an optoelectronic device.
Public/Granted literature
- US09923117B2 Semiconductor structure with inhomogeneous regions Public/Granted day:2018-03-20
Information query
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