Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
- Patent Title (中): LITHOGRAPHIC装置和装置制造方法
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Application No.: US14993810Application Date: 2016-01-12
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Publication No.: US20160124321A1Publication Date: 2016-05-05
- Inventor: Jacobus Johannus Leonardus Hendricus VERSPAY , Hans JANSEN , Marco Koert STAVENGA
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid.
Public/Granted literature
- US09645507B2 Lithographic apparatus and device manufacturing method Public/Granted day:2017-05-09
Information query
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