Invention Application
US20160365220A1 ANALYSIS METHOD USING ELECTRON MICROSCOPE, AND ELECTRON MICROSCOPE
有权
使用电子显微镜和电子显微镜的分析方法
- Patent Title: ANALYSIS METHOD USING ELECTRON MICROSCOPE, AND ELECTRON MICROSCOPE
- Patent Title (中): 使用电子显微镜和电子显微镜的分析方法
-
Application No.: US15247133Application Date: 2016-08-25
-
Publication No.: US20160365220A1Publication Date: 2016-12-15
- Inventor: Takashi Yamazaki
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki-shi
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki-shi
- Main IPC: H01J37/22
- IPC: H01J37/22 ; H01J37/26 ; H01J37/28 ; H01J37/21 ; H01J37/244

Abstract:
An analysis method using an electron microscope, detects by a first electronography detector an electron beam transmitted through or scattered by a sample to detect an ADF image of the sample, detects by a second electronography detector the electron beam passing through the first electronography detector to detect an MABF image, adjusts a focal point of the electron beam to be located on the film of the sample to obtain first and second electronographies by the first and second electronography detectors, respectively, adjusts the focal point of the electron beam to be located on the substrate of the sample to obtain third and fourth electronographies by the first and second electronography detectors, respectively, aligns positions of the second and fourth electronographies based on the first and third electronographies, and after the aligning, subtracts the fourth electronography from the second electronography to obtain an image of the film.
Public/Granted literature
- US09748073B2 Analysis method using electron microscope, and electron microscope Public/Granted day:2017-08-29
Information query