Invention Application
- Patent Title: LIQUID PROCESSING SYSTEM AND CONTROL METHOD
- Patent Title (中): 液体加工系统和控制方法
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Application No.: US15202150Application Date: 2016-07-05
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Publication No.: US20170001881A1Publication Date: 2017-01-05
- Inventor: NORIMITSU ABE , TAKESHI IDE , SHINJI KOBAYASHI , AKIHIKO SHIROTA , KENJI TAKEUCHI
- Applicant: KABUSHIKI KAISHA TOSHIBA
- Applicant Address: JP MINATO-KU
- Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee: KABUSHIKI KAISHA TOSHIBA
- Current Assignee Address: JP MINATO-KU
- Priority: JP2012-059745 20120316
- Main IPC: C02F1/00
- IPC: C02F1/00 ; C02F1/68 ; C02F1/76 ; C02F1/32

Abstract:
A liquid processing system has: processing units of n stages in which each processing unit includes one or a plurality of processing lines, each processing line includes an ultraviolet ray irradiating unit, and the number of processing lines of an m-th stage processing unit is larger than the number of processing lines of an m+1-th stage processing unit; and adjusting section which adjusts an output of an ultraviolet ray irradiating unit provided to a processing unit of a predetermined stage. An output of an ultraviolet ray irradiating unit provided to a processing unit of a stage other than the predetermined stage is each fixed, and the adjusting section adjusts the output of the let ray irradiating unit provided to the processing unit of the predetermined stage such that a liquid processed in an n-th stage processing unit of a final stage is in a desired processing state.
Public/Granted literature
- US20170283276A9 LIQUID PROCESSING SYSTEM AND CONTROL METHOD Public/Granted day:2017-10-05
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