Invention Application
US20170059997A1 PARTICLE IRRADIATION APPARATUS, BEAM MODIFIER DEVICE, AND SEMICONDUCTOR DEVICE INCLUDING A JUNCTION TERMINATION EXTENSION ZONE
审中-公开
粒子辐射装置，光束改造器装置和包括终端延伸区域的半导体装置
- Patent Title: PARTICLE IRRADIATION APPARATUS, BEAM MODIFIER DEVICE, AND SEMICONDUCTOR DEVICE INCLUDING A JUNCTION TERMINATION EXTENSION ZONE
- Patent Title (中): 粒子辐射装置，光束改造器装置和包括终端延伸区域的半导体装置
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Application No.: US15249758Application Date: 2016-08-29
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Publication No.: US20170059997A1Publication Date: 2017-03-02
- Inventor: Roland RUPP , Rudolf ELPELT , Romain ESTEVE
- Applicant: Infineon Technologies AG
- Applicant Address: DE Neubiberg
- Assignee: Infineon Technologies AG
- Current Assignee: Infineon Technologies AG
- Current Assignee Address: DE Neubiberg
- Priority: DE102015114429.8 20150828
- Main IPC: G03F7/20
- IPC: G03F7/20 ; H01L21/027 ; H01L29/06 ; H01L23/544 ; H01L29/16 ; H01L29/36
Abstract:
A beam modifier device is provided that includes scattering portions in which particles vertically impinging on an exposure surface of the beam modifier device are deflected from a vertical direction. A total permeability for the particles changes along a lateral direction parallel to the exposure surface.
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