Invention Application
- Patent Title: DEPOSITION MASK, METHOD FOR MANUFACTURING THE SAME, AND TOUCH PANEL
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Application No.: US15359527Application Date: 2016-11-22
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Publication No.: US20170130321A1Publication Date: 2017-05-11
- Inventor: Michinobu MIZUMURA , Shuji KUDO , Koichi KAJIYAMA
- Applicant: V TECHNOLOGY CO., LTD.
- Priority: JP2014-140709 20140708
- Main IPC: C23C14/04
- IPC: C23C14/04 ; C25D5/02 ; G06F3/041 ; C23C14/08 ; C23C14/34 ; C25D3/12 ; C25D5/14

Abstract:
The present invention provides a deposition mask including: a mask layer having an aperture pattern that is formed in conformity with a transparent electrode to be formed on a display surface of a display panel, with the same shape and size as the transparent electrode; and a support layer having plural support lines formed on one surface of the mask layer across the aperture pattern. In the mask, an arrangement pitch for the support lines of the support layer is set so as to reduce moire fringes or diffraction fringes that appear due to shadows of the support lines, which are transferred onto the transparent electrode as unevenness in deposition thickness.
Public/Granted literature
- US10533246B2 Deposition mask, method for manufacturing the same, and touch panel Public/Granted day:2020-01-14
Information query
IPC分类: