Invention Application
- Patent Title: PROCESS FOR CONTROLLING THE PERIOD OF A NANOSTRUCTURED BLOCK COPOLYMER FILM BASED ON STYRENE AND ON METHYL METHACRYLATE, AND NANOSTRUCTURED BLOCK COPOLYMER FILM
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Application No.: US15317803Application Date: 2015-06-01
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Publication No.: US20170145250A1Publication Date: 2017-05-25
- Inventor: Christophe NAVARRO , Celia NICOLET , Xavier CHEVALIER
- Applicant: Arkema France
- Applicant Address: FR Colombes
- Assignee: Arkema France
- Current Assignee: Arkema France
- Current Assignee Address: FR Colombes
- Priority: FR1455294 20140611
- International Application: PCT/FR2015/051430 WO 20150601
- Main IPC: C09D153/00
- IPC: C09D153/00 ; G03F7/00 ; B05D1/00 ; C08F297/02

Abstract:
The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).
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