Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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Application No.: US15470491Application Date: 2017-03-27
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Publication No.: US20170248854A1Publication Date: 2017-08-31
- Inventor: Bob STREEFKERK , Sjoerd Nicolaas Lambertus DONDERS , Roelof Frederik DE GRAAF , Christiaan Alexander HOOGENDAM , Martinus Hendrikus Antonius LEENDERS , Jeroen Johannes Sophia Maria MERTENS , Michel RIEPEN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
Public/Granted literature
- US10025196B2 Lithographic apparatus and device manufacturing method Public/Granted day:2018-07-17
Information query
IPC分类:
