Invention Application
- Patent Title: Method and Apparatus for Determining the Property of a Structure, Device Manufacturing Method
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Application No.: US15494056Application Date: 2017-04-21
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Publication No.: US20170315055A1Publication Date: 2017-11-02
- Inventor: Patricius Aloysius Jacobus TINNEMANS , Simon Gijsbert Josephus MATHIJSSEN , Sander Bas ROOBOL , Nan LIN
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP16167643.2 20160429
- Main IPC: G01N21/47
- IPC: G01N21/47 ; G01N21/88 ; G03F7/20

Abstract:
A structure of interest (T) is irradiated with radiation for example in the x-ray or EUV waveband, and scattered radiation is detected by a detector (19, 274, 908, 1012). A processor (PU) calculates a property such as linewidth (CD) or overlay (OV), for example by simulating (S16) interaction of radiation with a structure and comparing (S17) the simulated interaction with the detected radiation. The method is modified (S14a, S15a, S19a) to take account of changes in the structure which are caused by the inspection radiation. These changes may be for example shrinkage of the material, or changes in its optical characteristics. The changes may be caused by inspection radiation in the current observation or in a previous observation.
Public/Granted literature
- US10133192B2 Method and apparatus for determining the property of a structure, device manufacturing method Public/Granted day:2018-11-20
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