公开(公告)号：US20180136568A1

公开(公告)日：2018-05-17

申请号：US15788258

申请日：2017-10-19

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas ROOBOL ,  Simon Gijsbert Josephus MATHIJSSEN

IPC: G03F7/20 ,  H05G2/00 ,  G01N21/88 ,  G01N21/47 ,  G02F1/35

Abstract: Disclosed is an illumination source apparatus comprising a high harmonic generation medium, a pump radiation source and a spatial filter. The pump radiation source emits a beam of pump radiation having a profile comprising no pump radiation in a central region of the beam and excites the high harmonic generation medium so as to generate high harmonic radiation. The pump radiation and the generated high harmonic radiation are spatially separated beyond the focal plane of the beam of pump radiation The spatial filter is located beyond a focal plane of the beam of pump radiation, and blocks the pump radiation. Also disclosed is a method of generating high harmonic measurement radiation optimized for filtration of pump radiation therefrom.

公开(公告)号：US20230040124A1

公开(公告)日：2023-02-09

申请号：US17787253

申请日：2020-11-27

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang NIENHUYS ,  Teis Johan COENEN ,  Sander Bas ROOBOL ,  Jeroen COTTAAR ,  Seyed Iman MOSSAVAT ,  Niels GEYPEN ,  Sandy Claudia SCHOLZ ,  Christina Lynn PORTER

IPC: G03F7/20 ,  G03F9/00

Abstract: Disclosed is a method of metrology. The method comprises illuminating a radiation onto a substrate; obtaining measurement data relating to at least one measurement of each of one or more structures on the substrate; using a Fourier-related transform to transform the measurement data into a transformed measurement data; and extracting a feature of the substrate from the transformed measurement data, or eliminating an impact of a nuisance parameter.

公开(公告)号：US20240255279A1

公开(公告)日：2024-08-01

申请号：US18561892

申请日：2022-05-09

Applicant: ASML Netherlands B.V.

Inventor： Han-Kwang NIENHUYS ,  Patrick Philipp HELFENSTEIN ,  Sander Bas ROOBOL ,  Loes Frederique VAN RIJSWIJK ,  Sandy Claudia SCHOLZ

IPC: G01B11/27 ,  G03F7/00

CPC classification number: G01B11/27 ,  G03F7/70616 ,  G03F7/706835

Abstract: Disclosed is a method of measuring a target on a substrate using a metrology tool comprising an illumination source operable to emit an illumination beam for illuminating the target and a metrology sensor for collecting the scattered radiation having been scattered by the target. The method comprises calculating a target angle based on cell dimensions of a unit cell of said target in a first direction and a second direction orthogonal to said first direction; and order numbers of a selected pair of complementary diffraction orders in said first direction and second direction. At least one pair of measurement acquisitions is performed at a first target orientation and a second target orientation with respect to the illumination beam, wherein said target angle for at least one of said at least one pair of measurement acquisitions is an oblique angle.

公开(公告)号：US20170315456A1

公开(公告)日：2017-11-02

申请号：US15487558

申请日：2017-04-14

Applicant: ASML Netherlands B.V.

Inventor： Nan LIN ,  Arie Jeffrey DEN BOEF ,  Sander Bas ROOBOL ,  Simon Gijsbert Josephus MATHIJSSEN ,  Niels GEYPEN

IPC: G03F7/20 ,  H01S3/16 ,  H01S3/00 ,  G01B11/24 ,  G02F1/37 ,  G02F1/355 ,  H01S3/13

CPC classification number: G03F7/70616 ,  G01B11/24 ,  G01N21/9501 ,  G02F1/3551 ,  G02F1/37 ,  G03F7/70625 ,  G03F7/70633 ,  H01S3/0092 ,  H01S3/1305 ,  H01S3/1625 ,  H01S3/1636

Abstract: Disclosed is a method of performing a measurement in an inspection apparatus, and an associated inspection apparatus and HHG source. The method comprises configuring one or more controllable characteristics of at least one driving laser pulse of a high harmonic generation radiation source to control the output emission spectrum of illumination radiation provided by the high harmonic generation radiation source; and illuminating a target structure with said illuminating radiation. The method may comprise configuring the driving laser pulse so that the output emission spectrum comprises a plurality of discrete harmonic peaks. Alternatively the method may comprise using a plurality of driving laser pulses of different wavelengths such that the output emission spectrum is substantially monochromatic.

公开(公告)号：US20170184511A1

公开(公告)日：2017-06-29

申请号：US15388463

申请日：2016-12-22

Applicant: ASML Netherlands B.V.

Inventor： Arie Jeffrey DEN BOEF ,  Simon Gijsbert Josephus MATHIJSSEN ,  Nan LIN ,  Sander Bas ROOBOL

IPC: G01N21/88 ,  G03F7/20

CPC classification number: G01N21/8806 ,  G01N2021/8822 ,  G01N2201/061 ,  G03F7/70191 ,  G03F7/70483 ,  G03F7/7065 ,  G03F9/7049 ,  G03F9/7065

Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an illumination system that utilizes illuminating radiation with a wavelength of 2-40 nm. The illumination system includes an optical element that splits the illuminating radiation into a first and a second illuminating radiation and induces a time delay to the first or the second illuminating radiation. A detector detects the radiation that has been scattered by a target structure. The inspection apparatus has a processing unit operable to control a time delay between the first scattered radiation and the second scattered radiation so as to optimize a property of the combined first and second scattered radiation.

公开(公告)号：US20200098486A1

公开(公告)日：2020-03-26

申请号：US16556603

申请日：2019-08-30

Applicant: ASML Netherlands B.V.

Inventor： Teis Johan COENEN ,  Han-Kwang NIENHUYS ,  Sandy Claudia SCHOLZ ,  Sander Bas ROOBOL

IPC: G21K1/06 ,  G01T1/29 ,  G03F7/20

Abstract: Methods and apparatus for determining an intensity profile of a radiation beam. The method comprises providing a diffraction structure, causing relative movement of the diffraction structure relative to the radiation beam from a first position wherein the radiation beam does not irradiate the diffraction structure to a second position wherein the radiation beam irradiates the diffraction structure, measuring, with a radiation detector, diffracted radiation signals produced from diffraction of the radiation beam by the diffraction structure as the diffraction structure transitions from the first position to the second position or vice versa, and determining the intensity profile of the radiation beam based on the measured diffracted radiation signals.

公开(公告)号：US20190049393A1

公开(公告)日：2019-02-14

申请号：US16039764

申请日：2018-07-19

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas ROOBOL ,  Richard Quintanilha

IPC: G01N21/956 ,  G01N21/47 ,  G03F7/20 ,  G03F9/00

Abstract: A detector for detecting diffracted radiation which has been diffracted by a regular structure; said detector comprises: a sensor for sensing at least a portion of said diffracted radiation, said sensor having a first region and a second region; a first coating configured to allow transmission of radiation with wavelengths within a first range of wavelengths; and a second coating configured to allow transmission of radiation with wavelengths within a second range of wavelengths; wherein said first coating coats said first region of said sensor, and said second coating coats said second region of said sensor, and wherein said first and second regions are different regions.

公开(公告)号：US20180188658A1

公开(公告)日：2018-07-05

申请号：US15580500

申请日：2016-07-05

Applicant: ASML Netherlands B.V.

Inventor： Sietse Thijmen VAN DER POST ,  Ferry ZIJP ,  Sander Bas ROOBOL

IPC: G03F7/20

CPC classification number: G03F7/70633 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/7085

Abstract: A method involving a radiation intensity distribution for a target measured using an optical component at a gap from the target, the method including: determining a value of a parameter of interest using the measured radiation intensity distribution and a mathematical model describing the target, the model including an effective medium approximation for roughness of a surface of the optical component or a part thereof.

公开(公告)号：US20240168392A1

公开(公告)日：2024-05-23

申请号：US18277188

申请日：2022-01-12

Applicant: ASML Netherlands B.V.

Inventor： Petrus Wilhelmus SMORENBURG ,  Johan REININK ,  Marinus Petrus REIJNDERS ,  Han-Kwang NIENHUYS ,  David O'DWYER ,  Sander Bas ROOBOL ,  Christina Lynn PORTER ,  Stephen EDWARD

IPC: G03F7/00 ,  G21K1/10

CPC classification number: G03F7/706849 ,  G03F7/70233 ,  G03F7/70308 ,  G03F7/70316 ,  G21K1/10

Abstract: An assembly and method for separating first radiation and second radiation in the far field, wherein the first radiation and the second radiation have non-overlapping wavelengths, The assembly comprises a capillary structure, wherein the first radiation and the second radiation propagate coaxially along at least a portion of the capillary structure, and an optical structure configured to control the spatial distribution of the first radiation outside of the capillary structure, through interference, such that the intensity of the first radiation in the far field is reduced along an optical axis of the second radiation.

公开(公告)号：US20220134693A1

公开(公告)日：2022-05-05

申请号：US17433774

申请日：2020-01-28

Applicant: ASML Netherlands B.V.

Inventor： Sander Bas ROOBOL ,  Sietse Thijmen VAN DER POST

IPC: B29D11/00 ,  G03F7/20 ,  G03F7/00

Abstract: Disclosed is a method of manufacturing a reflector. The method comprises polishing (520) at least the uppermost surface of the uppermost substantially flat substrate of a plurality of substantially flat substrates, deforming (530) each substantially flat substrate into the desired shape, and bonding (540) the deformed substrates together to form said reflector. In an embodiment, the deforming and bonding is performed together using a mold.