Invention Application
- Patent Title: METHOD FOR PROCESSING A MONOCRYSTALLINE SUBSTRATE AND MICROMECHANICAL STRUCTURE
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Application No.: US15716538Application Date: 2017-09-27
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Publication No.: US20180086630A1Publication Date: 2018-03-29
- Inventor: Andre BROCKMEIER , Roland RUPP , Francisco Javier SANTOS RODRIGUEZ
- Applicant: Infineon Technologies AG
- Priority: DE102016118268.0 20160927
- Main IPC: B81C1/00
- IPC: B81C1/00 ; B81B3/00

Abstract:
In various embodiments, a method of processing a monocrystalline substrate is provided. The method may include severing the substrate along a main processing side into at least two monocrystalline substrate segments, and forming a micromechanical structure comprising at least one monocrystalline substrate segment of the at least two substrate segments.
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