Invention Application
- Patent Title: LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
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Application No.: US16286885Application Date: 2019-02-27
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Publication No.: US20190265596A1Publication Date: 2019-08-29
- Inventor: Joeri LOF , Antonius Theodorus Anna Maria DERKSEN , Christiaan Alexander HOOGENDAM , Aleksey KOLESNYCHENKO , Erik Roelof LOOPSTRA , Theodorus Marinus MODDERMAN , Johannes Catharinus Hubertus MULKENS , Roelof Aeilko Siebrand RITSEMA , Klaus SIMON , Joannes Theodoor DE SMIT , Alexander STRAAIJER , Bob STREEFKERK , Helmar VAN SANTEN
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: EP02257822.3 20021112; EP03252955.4 20030513
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F9/00
Abstract:
In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
Information query
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