Invention Application
- Patent Title: LITHOGRAPHIC METHOD
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Application No.: US16716568Application Date: 2019-12-17
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Publication No.: US20200117097A1Publication Date: 2020-04-16
- Inventor: Andre Bernardus JEUNINK , Laurentius Johannes Adrianus Van Bokhoven , Stan Henricus Van Der Meulen , Yang-Shan Huang , Federico La Torre , Bearrach Moest , Stefan Carolus Jacobus Antonius Keij , Enno Van Den Brink , Christine Henriette Schouten , Hoite Pieter Theodoor Tolsma
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Priority: com.zzzhc.datahub.patent.etl.us.BibliographicData$PriorityClaim@6914d129
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F1/64 ; G03F1/62
Abstract:
A lithographic apparatus comprising a support structure constructed to support a patterning device and associated pellicle, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam, and a projection system configured to project the patterned radiation beam onto a target portion of a substrate, wherein the support structure is located in a housing and wherein pressure sensors are located in the housing.
Public/Granted literature
- US10705438B2 Lithographic method Public/Granted day:2020-07-07
Information query
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