Invention Application
- Patent Title: HIGH ELECTRON MOBILITY TRANSISTOR
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Application No.: US16558329Application Date: 2019-09-03
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Publication No.: US20210036138A1Publication Date: 2021-02-04
- Inventor: Chun-Ming Chang , Chun-Liang Hou , Wen-Jung Liao
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Priority: CN201910710859.4 20190802
- Main IPC: H01L29/778
- IPC: H01L29/778 ; H01L29/20 ; H01L21/306 ; H01L29/66

Abstract:
A high electron mobility transistor (HEMT) includes a substrate; a buffer layer over the substrate, a GaN layer over the buffer layer, a first AlGaN layer over the GaN layer, a first AlN layer over the AlGaN layer, and a p-GaN layer over the first AlN layer.
Public/Granted literature
- US10971610B2 High electron mobility transistor Public/Granted day:2021-04-06
Information query
IPC分类: