Invention Application
- Patent Title: INSPECTION METHOD AND SYSTEM
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Application No.: US17671522Application Date: 2022-02-14
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Publication No.: US20220245780A1Publication Date: 2022-08-04
- Inventor: Wei FANG , Zhao-Li ZHANG , Jack JAU
- Applicant: ASML Netherlands B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06V10/44 ; G06V10/50 ; G06V10/46

Abstract:
An inspection method includes the following steps: identifying a plurality of patterns within an image; and comparing the plurality of patterns with each other for measurement values thereof. The above-mentioned inspection method uses the pattern within the image as a basis for comparison; therefore, measurement values of the plurality of pixels constructing the pattern can be processed with statistical methods and then compared, and the false rate caused by variation of a few pixels is decreased significantly. An inspection system implementing the above-mentioned method is also disclosed.
Public/Granted literature
- US11880971B2 Inspection method and system Public/Granted day:2024-01-23
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