Invention Application
- Patent Title: SILICON PRECURSOR COMPOUNDS AND METHOD FOR FORMING SILICON-CONTAINING FILMS
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Application No.: US17726079Application Date: 2022-04-21
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Publication No.: US20220359192A1Publication Date: 2022-11-10
- Inventor: Sungsil Cho , DaHye Kim , HwanSoo Kim , SooJin Lee , Bryan C. Hendrix
- Applicant: ENTEGRIS, INC.
- Applicant Address: US MA Billerica
- Assignee: ENTEGRIS, INC.
- Current Assignee: ENTEGRIS, INC.
- Current Assignee Address: US MA Billerica
- Main IPC: H01L21/02
- IPC: H01L21/02 ; C23C16/40 ; C23C16/455
Abstract:
Provided are certain silicon precursor compounds which are useful in the formation of silicon-containing films in the manufacture of semiconductor devices, and more specifically to compositions and methods for forming such silicon-containing films, such as films comprising silicon dioxide.
Information query
IPC分类:
