Invention Application
- Patent Title: SUBSTRATE TREATMENT APPARATUS WITH FLEX-LL FUNCTION, AND SUBSTRATE TRANSFER METHOD
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Application No.: US17736691Application Date: 2022-05-04
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Publication No.: US20220359241A1Publication Date: 2022-11-10
- Inventor: Yoshiyuki Umeoka
- Applicant: ASM IP Holding B.V.
- Applicant Address: NL Almere
- Assignee: ASM IP Holding B.V.
- Current Assignee: ASM IP Holding B.V.
- Current Assignee Address: NL Almere
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/677 ; G05B19/418

Abstract:
Examples of a substrate treatment apparatus include a plurality of load ports, a front-end module adjacent to the plurality of load ports, a plurality of load lock chambers adjacent to the front-end module, the plurality of load lock chambers include a plurality of wafer housing slots, a wafer handling chamber adjacent to the plurality of load lock chambers, a first wafer transfer device in the front-end module, a second wafer transfer device in the wafer handling chamber, and a controller including a processor and a memory configured to cause the processor to execute a program stored in the memory, or including a dedicated circuitry, to issue a command to a wafer moving device to move a wafer between the plurality of load lock chambers when predetermined wafer transfer conditions are satisfied.
Information query
IPC分类: