Invention Application
- Patent Title: METHOD OF REMOVING DEBRIS FROM A LIQUID PHOTOPOLYMER IN AN ADDITIVE FABRICATION DEVICE
-
Application No.: US17828293Application Date: 2022-05-31
-
Publication No.: US20220363001A1Publication Date: 2022-11-17
- Inventor: Adam Damiano , Andre Comella
- Applicant: Formlabs, Inc.
- Applicant Address: US MA Somerville
- Assignee: Formlabs, Inc.
- Current Assignee: Formlabs, Inc.
- Current Assignee Address: US MA Somerville
- Main IPC: B29C64/35
- IPC: B29C64/35 ; B29C64/393 ; B29C64/129 ; B33Y50/02 ; B29C64/227 ; B33Y40/00 ; B33Y10/00 ; B29C64/124 ; B01D39/16 ; B01J8/00

Abstract:
According to some aspects, a method is provided of removing debris from a liquid photopolymer in an additive fabrication device. According to some embodiments, a mesh of solid material may be formed in an additive fabrication device from a liquid photopolymer, and particles of debris present in the liquid photopolymer may adhere to the mesh. The debris may thereby be removed from the liquid photopolymer by removing the mesh from the additive fabrication device. The mesh may then be discarded.
Public/Granted literature
- US11897199B2 Method of removing debris from a liquid photopolymer in an additive fabrication device Public/Granted day:2024-02-13
Information query