Invention Publication
- Patent Title: AMIDINATE COMPOUND, DIMER COMPOUND THEREOF, THIN-FILM FORMING RAW MATERIAL, AND METHOD OF PRODUCING THIN FILM
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Application No.: US17917671Application Date: 2021-03-31
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Publication No.: US20230151041A1Publication Date: 2023-05-18
- Inventor: Tomoharu YOSHINO , Yoshiki OOE , Keisuke TAKEDA , Ryota FUKUSHIMA , Chiaki MITSUI , Atsushi YAMASHITA
- Applicant: ADEKA CORPORATION
- Applicant Address: JP Tokyo
- Assignee: ADEKA CORPORATION
- Current Assignee: ADEKA CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP 20070708 2020.04.10
- International Application: PCT/JP2021/013898 2021.03.31
- Date entered country: 2022-10-07
- Main IPC: C07F15/06
- IPC: C07F15/06 ; C01B33/027 ; C07F7/22 ; C23C16/18 ; C23C16/40 ; C23C16/455

Abstract:
The present invention provides an amidinate compound represented by the following general formula (1) or a dimer compound thereof, and a method of producing a thin-film including using the compound as a raw material:
where R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M represents a metal atom or a silicon atom, and “n” represents the valence of the atom represented by M, provided that at least one hydrogen atom of R1 to R3 is substituted with a fluorine atom.
where R1 and R2 each independently represent an alkyl group having 1 to 5 carbon atoms, R3 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, M represents a metal atom or a silicon atom, and “n” represents the valence of the atom represented by M, provided that at least one hydrogen atom of R1 to R3 is substituted with a fluorine atom.
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