Invention Application
- Patent Title: AREA SELECTIVE NANOSCALE-THIN LAYER DEPOSITION VIA PRECISE FUNCTIONAL GROUP LITHOGRAPHY
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Application No.: US18146043Application Date: 2022-12-23
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Publication No.: US20230132011A1Publication Date: 2023-04-27
- Inventor: Matthew R. Maschmann , Matthias J. Young
- Applicant: The Curators of the University of Missouri
- Applicant Address: US MO Columbia
- Assignee: The Curators of the University of Missouri
- Current Assignee: The Curators of the University of Missouri
- Current Assignee Address: US MO Columbia
- Main IPC: C23C16/02
- IPC: C23C16/02 ; C23C16/455 ; C23C16/40 ; C23C16/20

Abstract:
A method of depositing a nanoscale-thin film onto a substrate is disclosed. The method generally comprises depositing a layer of a solid or gaseous state functionalizing molecule onto or adjacent to the first surface of the substrate and exposing the first surface to a source of ionizing radiation, thereby functionalizing the first surface of the substrate. Once the layer of functionalizing molecule is removed, a nanoscale-thin film is then deposited onto the functionalized first surface of the substrate.
Public/Granted literature
- US12000037B2 Area selective nanoscale-thin layer deposition via precise functional group lithography Public/Granted day:2024-06-04
Information query
IPC分类: