公开(公告)号：US20230132011A1

公开(公告)日：2023-04-27

申请号：US18146043

申请日：2022-12-23

Applicant: The Curators of the University of Missouri

Inventor： Matthew R. Maschmann ,  Matthias J. Young

IPC: C23C16/02 ,  C23C16/455 ,  C23C16/40 ,  C23C16/20

Abstract: A method of depositing a nanoscale-thin film onto a substrate is disclosed. The method generally comprises depositing a layer of a solid or gaseous state functionalizing molecule onto or adjacent to the first surface of the substrate and exposing the first surface to a source of ionizing radiation, thereby functionalizing the first surface of the substrate. Once the layer of functionalizing molecule is removed, a nanoscale-thin film is then deposited onto the functionalized first surface of the substrate.

公开(公告)号：US12000037B2

公开(公告)日：2024-06-04

申请号：US18146043

申请日：2022-12-23

Applicant: The Curators of the University of Missouri

Inventor： Matthew R. Maschmann ,  Matthias J. Young

IPC: C23C16/02 ,  C23C16/20 ,  C23C16/40 ,  C23C16/455

CPC classification number: C23C16/0263 ,  C23C16/20 ,  C23C16/403 ,  C23C16/45527

Abstract: A method of depositing a nanoscale-thin film onto a substrate is disclosed. The method generally comprises depositing a layer of a solid or gaseous state functionalizing molecule onto or adjacent to the first surface of the substrate and exposing the first surface to a source of ionizing radiation, thereby functionalizing the first surface of the substrate. Once the layer of functionalizing molecule is removed, a nanoscale-thin film is then deposited onto the functionalized first surface of the substrate.

公开(公告)号：US11613807B2

公开(公告)日：2023-03-28

申请号：US17387185

申请日：2021-07-28

Applicant: THE CURATORS OF THE UNIVERSITY OF MISSOURI

Inventor： Matthew R. Maschmann ,  Matthias J. Young

IPC: C23C16/02 ,  C23C16/455 ,  C23C16/40 ,  C23C16/20

Abstract: A method of depositing a nanoscale-thin film onto a substrate is disclosed. The method generally comprises depositing a layer of a solid or gaseous state functionalizing molecule onto or adjacent to the first surface of the substrate and exposing the first surface to a source of ionizing radiation, thereby functionalizing the first surface of the substrate. Once the layer of functionalizing molecule is removed, a nanoscale-thin film is then deposited onto the functionalized first surface of the substrate.