Invention Publication
- Patent Title: SUBSTRATE BONDING METHOD
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Application No.: US17918038Application Date: 2022-07-28
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Publication No.: US20240038705A1Publication Date: 2024-02-01
- Inventor: Yunzhi LING , Siliang HE , Jianguo MA , Yuhao BI , Xingyu LIU , Chuan HU , Zhitao CHEN
- Applicant: INSTITUTE OF SEMICONDUCTORS, GUANGDONG ACADEMY OF SCIENCES
- Applicant Address: CN Guangzhou
- Assignee: INSTITUTE OF SEMICONDUCTORS, GUANGDONG ACADEMY OF SCIENCES
- Current Assignee: INSTITUTE OF SEMICONDUCTORS, GUANGDONG ACADEMY OF SCIENCES
- Current Assignee Address: CN Guangzhou
- International Application: PCT/CN2022/108718 2022.07.28
- Date entered country: 2022-10-10
- Main IPC: H01L23/00
- IPC: H01L23/00 ; H01R4/58 ; H01R43/00

Abstract:
A substrate bonding method includes: providing a first and a second substrate; forming, on the first substrate, a first metal micro-bump array including first metal pillar(s) formed on the first substrate and first metal nanowires formed thereon and spaced apart from each other; forming, on the second substrate, a second metal micro-bump array including second metal pillar(s) formed on the second substrate and second metal nanowires formed thereon and spaced apart from each other; pressing the first substrate onto the second substrate, such that the first and second metal micro-bump arrays are positioned and staggered with each other, forming a physically interwoven interlocking structure between the first and second metal nanowires; applying a filling material between the first and second substrates; curing the filling material to form a bonding cavity; and then performing confined heating reflux on the first and second metal micro-bump arrays in the bonding cavity.
Public/Granted literature
- US12266623B2 Substrate bonding method Public/Granted day:2025-04-01
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