• Patent Title: VARIABLE COMPOSITION TERNARY COMPOUND SEMICONDUCTOR ALLOYS, STRUCTURES, AND DEVICES
  • Application No.: US18401290
    Application Date: 2023-12-29
  • Publication No.: US20240222416A1
    Publication Date: 2024-07-04
  • Inventor: MICHAEL R. KRAMES
  • Applicant: OPNOVIX CORP.
  • Applicant Address: US CA PALO ALTO
  • Assignee: OPNOVIX CORP.
  • Current Assignee: OPNOVIX CORP.
  • Current Assignee Address: US CA PALO ALTO
  • Main IPC: H01L27/15
  • IPC: H01L27/15
VARIABLE COMPOSITION TERNARY COMPOUND SEMICONDUCTOR ALLOYS, STRUCTURES, AND DEVICES
Abstract:
InxAlyGa1-x-yN semiconductor structures having optoelectronic elements characterized by epitaxial layers having different in-plane a-lattice parameters and different InN mole fractions are disclosed. The active regions are configured to emit radiation in different wavelength ranges and are characterized by strain states within about 1% to 2% of compressive strain. The epitaxial layers are grown on patterned InxAlyGa1-x-yN seed regions on a single substrate, where the relaxed InGaN growth layers provide (0001) InxAlyGa1-x-yN growth surfaces characterized by different in-plane a-lattice parameters and different InN mole fractions. InxAlyGa1-x-yN semiconductor structures can be used in optoelectronic devices such as in light sources for illumination and in display applications.
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