Invention Publication
- Patent Title: RESISTIVE RANDOM ACCESS MEMORY DEVICE AND FABRICATION METHOD THEREOF
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Application No.: US18112483Application Date: 2023-02-21
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Publication No.: US20240260490A1Publication Date: 2024-08-01
- Inventor: Wen-Jen Wang , Yu-Huan Yeh , Chuan-Fu Wang
- Applicant: UNITED MICROELECTRONICS CORP.
- Applicant Address: TW Hsin-Chu City
- Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee: UNITED MICROELECTRONICS CORP.
- Current Assignee Address: TW Hsin-Chu City
- Priority: TW 2102908 2023.01.30
- Main IPC: H10N70/00
- IPC: H10N70/00 ; H10N70/20

Abstract:
A resistive memory device includes a substrate; a dielectric layer disposed on the substrate; a conductive via disposed in the dielectric layer; and a memory stack structure disposed on the conductive via and the dielectric layer. The memory stack structure includes a bottom electrode layer, a resistive switching layer on the bottom electrode layer, and a top electrode layer on the resistive switching layer. The top electrode layer includes at least two physically separated sub-electrode portions.
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