Invention Grant
- Patent Title: Restrictor shield having a variable effective throughout area
- Patent Title (中): 限制器屏蔽具有可变的有效整个区域
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Application No.: US612651Application Date: 1996-03-08
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Publication No.: US5901751APublication Date: 1999-05-11
- Inventor: David Datong Huo
- Applicant: David Datong Huo
- Applicant Address: CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: CA Santa Clara
- Main IPC: F16K51/02
- IPC: F16K51/02 ; B01J3/03 ; C23C14/56 ; F04B37/08 ; F16K31/00 ; G05D7/01 ; H01L21/203 ; F15D1/02
Abstract:
Apparatus, positioned at an inlet port to a pump, for shielding the pump from a process chamber of a semiconductor wafer processing system, where the apparatus has a variable effective throughput area. Specifically, the apparatus is a restrictor shield having a first effective throughput area during processing and a second effective throughput area during bakeout, where the first effective throughput area is typically less than the second effective throughput area. The selection of the effective throughput area is directly responsive to the temperature within the process chamber.
Public/Granted literature
- US5152707A Conformable anvil for supporting in-process face panels of tension mask color cathode ray tubes Public/Granted day:1992-10-06
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