Invention Grant
- Patent Title: Pressure responsive clamp for a processing chamber
- Patent Title (中): 用于处理室的压力响应夹
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Application No.: US590030Application Date: 1996-02-02
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Publication No.: US6012600APublication Date: 2000-01-11
- Inventor: Thanh Pham , Eugene Fukshansky , David Wanamaker
- Applicant: Thanh Pham , Eugene Fukshansky , David Wanamaker
- Applicant Address: CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: CA Santa Clara
- Main IPC: B65D45/18
- IPC: B65D45/18 ; H01L21/687
Abstract:
A method and apparatus is provided which secures the lid of a processing chamber in abutting engagement with the walls of the chamber to form an airtight processing environment and which provides for the release of pressure within the chamber in the event of a sudden change in pressure such as an over pressure excursion. The method and apparatus generally comprise a clamp member having a base portion for mounting the clamp to a first surface, a contact portion for contacting a second surface and maintaining a desired relationship between the first and second surfaces, and a deflecting portion which allows separation of the first and second surfaces to relieve pressure behind the first or second surface and return to the desired relationship between the first and second surfaces.
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