Invention Grant
- Patent Title: Hole metal-filling method
- Patent Title (中): 孔金属填充法
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Application No.: US10020700Application Date: 2001-10-30
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Publication No.: US06638858B2Publication Date: 2003-10-28
- Inventor: David C. H. Cheng
- Applicant: David C. H. Cheng
- Main IPC: H01L2144
- IPC: H01L2144

Abstract:
A hole metal-filling method, applied to hole filling and electroplating a printed circuit board which has been mechanical-drilled with holes. A plurality of holes is drilled in a substrate. The substrate is placed on a platform. A plurality of metal balls is disposed on a surface of the substrate. By vibrating the platform, a part of the metal balls roll into the holes, while the metal balls not rolling into the holes are removed. The substrate is then placed on a press down unit. The metal balls in the holes are pressed to level with surfaces of the substrate. The substrate is directly electroplated for forming a plating layer closely dovetail to the metal balls.
Public/Granted literature
- US20030082896A1 Hole metal-filling method Public/Granted day:2003-05-01
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