- Patent Title: Ion source providing ribbon beam with controllable density profile
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Application No.: US10136047Application Date: 2002-05-01
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Publication No.: US06664547B2Publication Date: 2003-12-16
- Inventor: Victor M. Benveniste
- Applicant: Victor M. Benveniste
- Main IPC: H01J2700
- IPC: H01J2700

Abstract:
An ion source is disclosed for ion implantation applications, having control apparatus for selectively adjusting a density profile associated with an elongated ion beam being extracted from a plasma confinement chamber. The control apparatus comprises a plurality of magnet pairs proximate an elongated extraction exit through which a ribbon beam is extracted from the ion source, with the magnet pairs individually comprising upper and lower electro-magnets disposed above and below the extraction exit opening to provide adjustable magnetic fields in a pre-extraction region so as to adjust the density profile of an extracted ribbon beam.
Public/Granted literature
- US20030205679A1 Ion source providing ribbon beam with controllable density profile Public/Granted day:2003-11-06
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