• Patent Title: Ion source providing ribbon beam with controllable density profile
  • Application No.: US10136047
    Application Date: 2002-05-01
  • Publication No.: US06664547B2
    Publication Date: 2003-12-16
  • Inventor: Victor M. Benveniste
  • Applicant: Victor M. Benveniste
  • Main IPC: H01J2700
  • IPC: H01J2700
Ion source providing ribbon beam with controllable density profile
Abstract:
An ion source is disclosed for ion implantation applications, having control apparatus for selectively adjusting a density profile associated with an elongated ion beam being extracted from a plasma confinement chamber. The control apparatus comprises a plurality of magnet pairs proximate an elongated extraction exit through which a ribbon beam is extracted from the ion source, with the magnet pairs individually comprising upper and lower electro-magnets disposed above and below the extraction exit opening to provide adjustable magnetic fields in a pre-extraction region so as to adjust the density profile of an extracted ribbon beam.
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