公开(公告)号：US06696793B2

公开(公告)日：2004-02-24

申请号：US10294813

申请日：2002-11-15

Applicant: Takatoshi Yamashita

Inventor： Takatoshi Yamashita

IPC: H01J2700

CPC classification number: H01J27/14

Abstract: An ion source called as a Bernas-type ion source is additionally provided with a positive electrode and a bias power source. The positive electrode is provided in a plasma production chamber and is electrically isolated therefrom. The positive electrode has three openings at least at both sides of a X direction along a magnetic field produced in a magnetic field generator and at a side of an ion extraction opening (a side of ion beam extraction direction). The bias power source applies a positive bias voltage to the positive electrode and to the plasma production chamber. With combination of constituent elements, the positive electrode serves to push back the ion in the plasma and further functions to suck a secondary electron in the plasma, thereby increase the rate of the multiply charged ion in the plasma.

Abstract translation: 称为伯纳斯型离子源的离子源另外设置有正电极和偏置电源。 正电极设置在等离子体生产室中并与其电隔离。 正极在磁场发生器中产生的磁场和离子提取开口侧（离子束取出方向的一侧）至少在X方向的两侧具有三个开口。 偏置电源对正电极和等离子体产生室施加正偏置电压。 通过构成元件的组合，正极用于推回等离子体中的离子，并且进一步起作用以吸收等离子体中的二次电子，从而增加等离子体中的多电荷离子的速率。

公开(公告)号：US06737640B2

公开(公告)日：2004-05-18

申请号：US10221845

申请日：2002-09-16

Applicant: Yoshiaki Kato

Inventor： Yoshiaki Kato

IPC: H01J2700

CPC classification number: H01J49/165 ,  G01N27/62 ,  G01N30/7266 ,  Y10T436/24

Abstract: The object of the present invention is to provide an electrospray ionization mass analysis apparatus and the method thereof provided with an ESI ion source that can be directly coupled to a micro LC. The present invention provides an electrospray ionization mass analysis apparatus characterized in that a sample solution is led into a capillary tube, and high voltage is applied to the tip of this capillary tube, thereby allowing a spray ion flow of the aforementioned solution to be generated by an electrospray ion source provided therein. The ion flow generated by this ion source is led to an ion storage type spectrometer disposed in an vacuum chamber where it is subjected to mass sweeping, and the swept ion is detected by a detector so that a mass spectrum is obtained. This electrospray ionization mass analysis apparatus is further characterized by comprising a high voltage DC power source for application of the aforementioned high voltage formed by AC voltage superimposed on the DC voltage, and a AC power source. This invention ensures stable and highly sensitive ESI ionization to be performed at a flow rate ranging from several 10 &mgr;L/min to several &mgr;L/min.

Abstract translation: 本发明的目的是提供一种电喷雾离子化质量分析装置及其提供有可直接耦合到微LC的ESI离子源的方法。本发明提供一种电喷雾离子质量分析装置，其特征在于， 溶液被引入毛细管中，并且高压施加到毛细管的尖端，从而允许由其中提供的电喷雾离子源产生上述溶液的喷雾离子流。 由该离子源产生的离子流被导入设置在真空室中的离子存储型光谱仪，在其中进行质量扫描，并且通过检测器检测扫描离子，从而获得质谱。 该电喷雾离子化质量分析装置的特征还在于，包括用于施加由叠加在直流电压上的交流电压形成的上述高电压的高压直流电源和交流电源。本发明确保了稳定且高灵敏度的ESI电离 以几10L / min至几μL/ min的流速进行。

公开(公告)号：US06515290B1

公开(公告)日：2003-02-04

申请号：US09654958

申请日：2000-09-05

Applicant: Richard J. Rzeszut ,  James P. Quill

Inventor： Richard J. Rzeszut ,  James P. Quill

IPC: H01J2700

CPC classification number: H01J37/3171 ,  H01J37/08

Abstract: A gas delivery system for an ion implantation system comprises a gas source at a first voltage potential and an ion source at a second voltage potential which is larger than the first voltage potential. The system further comprises an electrically insulative connector coupled between the gas source and the ion source. The present invention also comprises a method of delivering gas to an ion implantation system which comprises maintaining a voltage potential of a source gas at a storage location at a first voltage potential that is less than a second voltage potential at an ion source of the ion implantation system and delivering the source gas from the storage location to the ion source.

Abstract translation: 用于离子注入系统的气体输送系统包括处于第一电压电势的气体源和大于第一电压电位的第二电压电位的离子源。 该系统还包括耦合在气体源和离子源之间的电绝缘连接器。 本发明还包括将气体输送到离子注入系统的方法，该方法包括将离子注入离子源处的小于第二电压电位的第一电压电位的源气体的电位电位保持在存储位置 将源气体从储存位置输送到离子源。

公开(公告)号：US06300637B1

公开(公告)日：2001-10-09

申请号：US09174034

申请日：1998-10-16

Applicant: Steven C. Beu ,  Robert W. Arnold

Inventor： Steven C. Beu ,  Robert W. Arnold

IPC: H01J2700

CPC classification number: H01J49/10

Abstract: The ionization efficiency of a mass spectrometer is increased by creating a potential well between the electron source and the electron collector. The potential well is created by applying to the collector a reflection potential having an amplitude which is the same as or substantially the same as the amplitude of the potential applied to the electron source and a polarity which is the same as the polarity of the electron source potential. The potentials applied to the electron source and electron collector are relative to the ionization region effected between the source and collector. Many of the electrons produced by the electron source oscillate back and forth in the potential well thereby allowing those electrons a greater opportunity to interact with sample molecules to thus increase ionization efficiency.

Abstract translation: 通过在电子源和电子收集器之间产生一个势阱来提高质谱仪的电离效率。 通过向集电极施加具有与施加到电子源的电位的幅度相同或基本相同的幅度的反射电位和与电子源的极性相同的极性而产生势阱 潜在。 施加到电子源和电子收集器的电位相对于源极和集电极之间的电离区域。 由电子源产生的许多电子在势阱中来回振荡，从而允许这些电子与样品分子相互作用的机会更大，从而提高电离效率。

公开(公告)号：US06288403B1

公开(公告)日：2001-09-11

申请号：US09416159

申请日：1999-10-11

Applicant: Thomas N. Horsky ,  Alexander S. Perel ,  William K. Loizides

Inventor： Thomas N. Horsky ,  Alexander S. Perel ,  William K. Loizides

IPC: H01J2700

CPC classification number: H01J27/08

Abstract: An ion source (50) for an ion implanter is provided, comprising a remotely located vaporizer (51) and an ionizer (53) connected to the vaporizer by a feed tube (62). The vaporizer comprises a sublimator (52) for receiving a solid source material such as decaborane and sublimating (vaporizing) the decaborane. A heating mechanism is provided for heating the sublimator, and the feed tube connecting the sublimator to the ionizer, to maintain a suitable temperature for the vaporized decaborane. The ionizer (53) comprises a body (96) having an inlet (119) for receiving the vaporized decaborane; an ionization chamber (108) in which the vaporized decaborane may be ionized by an energy-emitting element (110) to create a plasma; and an exit aperture (126) for extracting an ion beam comprised of the plasma. A cooling mechanism (100, 104) is provided for lowering the temperature of walls (128) of the ionization chamber (108) (e.g., to below 350° C.) during ionization of the vaporized decaborane to prevent dissociation of vaporized decaborane molecules into atomic boron ions. In addition, the energy-emitting element is operated at a sufficiently low power level to minimize plasma density within the ionization chamber (108) to prevent additional dissociation of the vaporized decaborane molecules by the plasma itself.

Abstract translation: 提供了一种用于离子注入机的离子源（50），其包括位于远处的蒸发器（51）和通过进料管（62）连接到蒸发器的离子发生器（53）。 蒸发器包括用于接收诸如十硼烷的固体源材料和升华（蒸发）十硼烷的升华器（52）。 提供加热机构用于加热升华器和将升华器连接到离子发生器的进料管，以保持蒸发的十硼烷的合适温度。 电离器（53）包括具有用于接收蒸发的十硼烷的入口（119）的主体（96） 电离室（108），其中蒸发的十硼烷可以被能量发射元件（110）电离以产生等离子体; 以及用于提取由等离子体组成的离子束的出射孔（126）。 提供冷却机构（100,104），用于在蒸发的十硼烷的电离期间降低电离室（108）的壁（128）的温度（例如，低于350℃），以防止汽化的十硼烷分子分解成 原子硼离子 此外，能量发射元件以足够低的功率水平操作以最小化电离室（108）内的等离子体密度，以防止蒸发的十硼烷分子由等离子体本身的附加解离。

公开(公告)号：US06803585B2

公开(公告)日：2004-10-12

申请号：US10032425

申请日：2001-12-31

Applicant: Yuri Glukhoy

Inventor： Yuri Glukhoy

IPC: H01J2700

CPC classification number: H01J27/18 ,  H01J37/08 ,  H01J2237/0817 ,  H01J2237/31701

Abstract: An ECR ion-beam source for use in an ion implanter has a sealed plasma chamber in which plasma is excited by microwave radiation of 2.45 GHz in combination with an external magnetic field generated by permanent magnets surrounding the plasma chamber. The magnets cause electron-cyclotron resonance for the electrons of the plasma thus creating conditions for efficient absorption of the microwave energy. The same magnets generate a magnetic field, which compresses the plasma toward the center for confining the plasma within the plasma chamber. The ion source also has an RF pumping unit that pumps into the plasma the RF energy. The RF pumping unit has a unique additional function of RF magnetron sputtering of solid targets converted into a gaseous working medium used for implantation in an ionized form. For obtaining elongated belt-type ion beams (having a width of 1 m or longer), the ion source may contain a microwave pumping system having several output windows arranged in series along the axis of the plasma chamber and on diametrically opposite sides thereof. The windows are continuously cleaned from the contaminants that might precipitate onto their surfaces. A standard-type sand blaster can be used for cleaning of the windows.

Abstract translation: 用于离子注入机的ECR离子束源具有密封的等离子体室，其中等离子体由2.45GHz的微波辐射与由围绕等离子体室的永磁体产生的外部磁场相结合而激发。 这些磁体对于等离子体的电子产生电子回旋共振，从而产生有效吸收微波能量的条件。 相同的磁体产生磁场，其将等离子体压向中心，以将等离子体限制在等离子体室内。 离子源还具有RF抽运单元，其将等离子体泵送到RF能量。 射频泵送单元具有独特的附加功能，即将固体靶的RF磁控溅射转换成用于以离子化形式植入的气态工作介质。 为了获得细长的带式离子束（宽度为1μm或更长），离子源可以包含具有多个输出窗口的微波泵送系统，该输出窗口沿着等离子体室的轴线和其直径相对的侧面串联布置。 这些窗户可以从可能沉淀在其表面上的污染物中持续清洁。 标准型喷砂机可用于清洁窗户。

公开(公告)号：US06768119B2

公开(公告)日：2004-07-27

申请号：US09826341

申请日：2001-04-04

Applicant: Juan F. de la Mora ,  Manuel Gamero-Castano ,  Manuel Martinez-Sanchez

Inventor： Juan F. de la Mora ,  Manuel Gamero-Castano ,  Manuel Martinez-Sanchez

IPC: H01J2700

CPC classification number: H01J27/26 ,  H01J37/08 ,  H01J37/30 ,  H01J2237/061 ,  H01J2237/0805 ,  H01J2237/0815 ,  H01J2237/31749

Abstract: A new method and apparatus to produce drops with diameters several tens of nanometers and/or positive or negative ions with a wide range of chemical composition and masses as large as several kiloDalton is based on creating Taylor cone-jets of high electrical conductivity, moderate viscosity, and low volatility liquids under reduced pressure. The liquid is supplied at a controlled flow rate into a region at low pressure exposed to an electric field sufficient to electrically atomize it. Suitably charged, shaped and placed electrodes create the necessary electric field to form the Taylor cone and extract the charged particles it produces, with a desired energy and direction. Subsequent ion manipulation supplies beams of ions and/or nanoparticles for applications such as electrical propulsion or surface treatment. No liquids suitable to practice this invention have been known in the past and are introduced here as a key aspect of the invention. They are such as electrolytes of formamide (or organic liquids such as amides, alcohols, glycols, esters, ketones, organic phosphates or carbonates, etc., and mixtures of one or more of these components), ionic liquids (neat or mixed with other ionic liquids, molecular solvents and/or salts), molten salts and inorganic acids.

Abstract translation: 一种生产具有数十纳米和/或正或负离子的液滴的新方法和装置，其化学组成和质量范围宽达几千顿顿是基于产生高电导率，适中粘度的泰勒锥流 ，低挥发性液体。 将液体以受控流速供应到暴露于足以使其电雾化的电场的低压区域。 适当带电的，形状和放置的电极产生必要的电场以形成泰勒锥并且以期望的能量和方向提取其产生的带电粒子。 随后的离子操作为诸如电推进或表面处理的应用提供离子束和/或纳米颗粒。 过去没有适用于实施本发明的液体，这里作为本发明的关键方面被介绍。 它们是诸如甲酰胺的电解质（或诸如酰胺，醇，二醇，酯，酮，有机磷酸酯或碳酸酯等的有机液体，以及这些组分中的一种或多种的混合物），离子液体（整齐或与其它混合物 离子液体，分子溶剂和/或盐），熔融盐和无机酸。

公开(公告)号：US06664547B2

公开(公告)日：2003-12-16

申请号：US10136047

申请日：2002-05-01

Applicant: Victor M. Benveniste

Inventor： Victor M. Benveniste

IPC: H01J2700

CPC classification number: H01J37/08 ,  H01J2237/0835 ,  H01J2237/31701

Abstract: An ion source is disclosed for ion implantation applications, having control apparatus for selectively adjusting a density profile associated with an elongated ion beam being extracted from a plasma confinement chamber. The control apparatus comprises a plurality of magnet pairs proximate an elongated extraction exit through which a ribbon beam is extracted from the ion source, with the magnet pairs individually comprising upper and lower electro-magnets disposed above and below the extraction exit opening to provide adjustable magnetic fields in a pre-extraction region so as to adjust the density profile of an extracted ribbon beam.

公开(公告)号：US06548817B1

公开(公告)日：2003-04-15

申请号：US09540678

申请日：2000-03-31

Applicant: Andre Anders ,  Robert A. MacGill

Inventor： Andre Anders ,  Robert A. MacGill

IPC: H01J2700

CPC classification number: H01J37/32055 ,  H01J37/32623 ,  H01J37/3266 ,  H01J2237/022 ,  H05H1/48 ,  H05H2001/488

Abstract: A cathodic arc plasma source has an anode formed of a plurality of spaced baffles which extend beyond the active cathode surface of the cathode. With the open baffle structure of the anode, most macroparticles pass through the gaps between the baffles and reflect off the baffles out of the plasma stream that enters a filter. Thus the anode not only has an electrical function but serves as a prefilter. The cathode has a small diameter, e.g. a rod of about ¼ inch (6.25 mm) diameter. Thus the plasma source output is well localized, even with cathode spot movement which is limited in area, so that it effectively couples into a miniaturized filter. With a small area cathode, the material eroded from the cathode needs to be replaced to maintain plasma production. Therefore, the source includes a cathode advancement or feed mechanism coupled to cathode rod. The cathode also requires a cooling mechanism. The movable cathode rod is housed in a cooled metal shield or tube which serves as both a current conductor, thus reducing ohmic heat produced in the cathode, and as the heat sink for heat generated at or near the cathode. Cooling of the cathode housing tube is done by contact with coolant at a place remote from the active cathode surface. The source is operated in pulsed mode at relatively high currents, about 1 kA. The high arc current can also be used to operate the magnetic filter. A cathodic arc plasma deposition system using this source can be used for the deposition of ultrathin amorphous hard carbon (a-C) films for the magnetic storage industry.

Abstract translation: 阴极电弧等离子体源具有由多个隔开的隔板形成的阳极，该隔板延伸超过阴极的活性阴极表面。 利用阳极的开放的挡板结构，大多数大颗粒通过挡板之间的间隙并从进入过滤器的等离子体流中反射出挡板。 因此，阳极不仅具有电功能，而且用作预滤器。 阴极具有小的直径，例如 直径约1/4英寸（6.25毫米）的棒。 因此，等离子体源输出很好地定位，即使在面积有限的阴极点运动中，也可以有效地耦合到小型化滤波器中。 对于小面积的阴极，需要更换从阴极侵蚀的材料来维持等离子体生产。 因此，源包括耦合到阴极棒的阴极前进或进给机构。 阴极还需要冷却机构。 可移动阴极杆容纳在用作电流导体的冷却金属屏蔽或管中，从而降低在阴极中产生的欧姆热，以及作为在阴极处或附近产生的热的散热器。 通过在远离有源阴极表面的位置处与冷却剂接触来完成阴极壳体管的冷却。 源以约1 kA的相对较高的电流在脉冲模式下工作。 高电弧电流也可用于操作磁性过滤器。 使用该源的阴极电弧等离子体沉积系统可用于沉积用于磁存储工业的超薄无定形硬碳（a-C）膜。

公开(公告)号：US06215125B1

公开(公告)日：2001-04-10

申请号：US09154426

申请日：1998-09-16

Applicant: Jiong Chen ,  Brian S. Freer ,  John F. Grant ,  Lawrence T. Jacobs ,  Joseph L. Malenfant, Jr.

Inventor： Jiong Chen ,  Brian S. Freer ,  John F. Grant ,  Lawrence T. Jacobs ,  Joseph L. Malenfant, Jr.

IPC: H01J2700

CPC classification number: H01J27/08 ,  H01J2237/08 ,  H01J2237/31701

Abstract: The present invention provides a method of extending, i.e. prolonging, the operating lifetime of hot cathode discharge ion source by utilizing and introducing a nitrogen-containing co-bleed gas into an ion implantation apparatus which contains at least a hot cathode discharge ion source and an ion implantation gas such as GeF4.

Abstract translation: 本发明提供一种通过利用并将含氮共渗气体引入到至少含有热阴极放电离子源的离子注入装置中来延长，即延长热阴极放电离子源的使用寿命的方法， 离子注入气体如GeF4。