Invention Grant
US06749476B2 Field emission display cathode (FED) plate with an internal via and the fabrication method for the cathode plate 有权
具有内部通孔的场发射显示阴极(FED)板和阴极板的制造方法

  • Patent Title: Field emission display cathode (FED) plate with an internal via and the fabrication method for the cathode plate
  • Patent Title (中): 具有内部通孔的场发射显示阴极(FED)板和阴极板的制造方法
  • Application No.: US09986175
    Application Date: 2001-11-07
  • Publication No.: US06749476B2
    Publication Date: 2004-06-15
  • Inventor: Chih-Chin Chang
  • Applicant: Chih-Chin Chang
  • Priority: TW90102470A 20010206
  • Main IPC: H01J924
  • IPC: H01J924
Field emission display cathode (FED) plate with an internal via and the fabrication method for the cathode plate
Abstract:
an FED cathode plate with internal via includes an internal via; a second dielectric layer; a second gate line; a metal layer 12 covering the gate line and the internal via; and a contact. The internal via is located on a typical tape line. The second dielectric layer is located on the tape line and abutted against the internal via, thereby connecting to an anode by an adhesive. The second gate line is located on the second dielectric layer and abutted against the internal via. The metal layer is covered over the first gate line, the internal via, and the second gate line; and the contact is located on the tape line and connected adjacent to the second dielectric layer, thereby electrically connecting a lead to outside.
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