Invention Grant
- Patent Title: Technique for writing with a raster scanned beam
- Patent Title (中): 用光栅扫描光束写入的技术
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Application No.: US10114399Application Date: 2002-04-01
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Publication No.: US06828570B2Publication Date: 2004-12-07
- Inventor: Lee H. Veneklasen , Stephen Rishton , Stacey J. Winter , Volker Boegli , Huei Mei Kao
- Applicant: Lee H. Veneklasen , Stephen Rishton , Stacey J. Winter , Volker Boegli , Huei Mei Kao
- Main IPC: H01J37302
- IPC: H01J37302

Abstract:
Provided is a technique for generating patterns with a raster scanned beam in a photolithographic system that employs a multiple blank position flash cycle. In accordance with one embodiment of the present invention, a beam creates a shadow of a first aperture that impinges upon a region of a stop, referred to as a first blank position. The beam is deflected so that the shadow of the first aperture moves along a first direction to a flash position, in which a portion thereof superimposes a second aperture located in the stop. To complete the flash cycle, the beam is deflected so that shadow of the first aperture impinges upon a second region of the stop, referred to as second blank position. As a result, during the flash cycle, the beam is deflected in one direction to impinge upon two different blank positions.
Public/Granted literature
- US20030183782A1 Technique for writing with a raster scanned beam Public/Granted day:2003-10-02
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