Invention Grant
- Patent Title: High-speed electromechanical shutter for imaging spectrographs
- Patent Title (中): 用于成像光谱仪的高速机电快门
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Application No.: US10356932Application Date: 2003-01-30
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Publication No.: US06937331B1Publication Date: 2005-08-30
- Inventor: Quang-Viet Nguyen
- Applicant: Quang-Viet Nguyen
- Applicant Address: US DC Washington
- Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee: The United States of America as represented by the Administrator of the National Aeronautics and Space Administration
- Current Assignee Address: US DC Washington
- Agent Kent N. Stone; Laura Shunk
- Main IPC: G01J3/28
- IPC: G01J3/28 ; G01J3/40 ; G01B26/04

Abstract:
The present invention presents a high-speed electromechanical shutter which has at least two rotary beam choppers that are synchronized using a phase-locked loop electronic control to reduce the duty cycle. These choppers have blade means that can comprise discs or drums, each having about 60 (+/−15) slots which are from about 0.3 to about 0.8 mm wide and about 5 to about 20 mm long (radially) which are evenly distributed through out 360°, and a third rotary chopper which is optically aligned has a small number of slots, such as for example, 1 to 10 slots which are about 1 to about 2 mm wide and about 5 to about 20 mm long (radially). Further the blade means include phase slots that allow the blade means to be phase locked using a closed loop control circuit. In addition, in a preferred embodiment, the system also has a leaf shutter. Thus the invention preferably achieves a gate width of less than about 100 microseconds, using motors that operate at 3000 to 10,000 rpm, and with a phase jitter of less than about 1.5 microseconds, and further using an aperture with more than about 75% optical transmission with a clear aperture of about 0.8 mm×10 mm. The system can be synchronized to external sources at 0 6 kHz lasers, data acquisition systems, and cameras.
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