Invention Grant
US06960773B2 System and method for maskless lithography using an array of improved diffractive focusing elements
失效
使用改进的衍射聚焦元件的阵列的无掩模光刻的系统和方法
- Patent Title: System and method for maskless lithography using an array of improved diffractive focusing elements
- Patent Title (中): 使用改进的衍射聚焦元件的阵列的无掩模光刻的系统和方法
-
Application No.: US10624316Application Date: 2003-07-21
-
Publication No.: US06960773B2Publication Date: 2005-11-01
- Inventor: Rajesh Menon , Dario Gil , David Carter , Henry I. Smith , George Barbastathis
- Applicant: Rajesh Menon , Dario Gil , David Carter , Henry I. Smith , George Barbastathis
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Gauthier & Connors LLP
- Main IPC: G03F7/20
- IPC: G03F7/20 ; G03F7/207
Abstract:
A maskless lithography system is disclosed that includes an array of blazed diffractive zone plates, each of which focuses an energy beam into an array of images in order to create a permanent pattern on an adjacent substrate in certain embodiments. In further embodiments, an array of apodized diffractive elements may also be used.
Public/Granted literature
- US20040069957A1 System and method for maskless lithography using an array of improved diffractive focusing elements Public/Granted day:2004-04-15
Information query
IPC分类:
