Invention Grant
- Patent Title: Discrete circuit component having fabrication stage clogged through-holes and process of making the same
- Patent Title (中): 具有制造阶段堵塞的通孔的分立电路部件及其制造方法
-
Application No.: US10249788Application Date: 2003-05-08
-
Publication No.: US06989559B2Publication Date: 2006-01-24
- Inventor: Wen-Long Chen , Cheng-Chieh Yang , Chih-Liang Hu
- Applicant: Wen-Long Chen , Cheng-Chieh Yang , Chih-Liang Hu
- Applicant Address: TW Taipei Hsien
- Assignee: Comchip Technology Co., Ltd.
- Current Assignee: Comchip Technology Co., Ltd.
- Current Assignee Address: TW Taipei Hsien
- Agency: Jiang Chyun IP Office
- Priority: TW92107483A 20030402
- Main IPC: H01L29/76
- IPC: H01L29/76 ; H01L29/94 ; H01L31/062 ; H01L31/113 ; H01L31/119

Abstract:
A discrete circuit component is made from a substrate with the first and second surfaces thereof each having a corresponding matrix of electrically conductive segments. A plated through-hole connects each of the conductive segments of each the first and second conductive segments electrically. The through-hole is first clogged and then subsequently cleared of clogging in the fabrication stages.
Public/Granted literature
Information query
IPC分类: