Invention Grant
- Patent Title: Image focus monitor for alternating phase shift masks
- Patent Title (中): 用于交替相移掩模的图像聚焦监视器
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Application No.: US10442432Application Date: 2003-05-20
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Publication No.: US07033708B2Publication Date: 2006-04-25
- Inventor: Edita Tejnil
- Applicant: Edita Tejnil
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G03F7/207 ; C03B23/00 ; G01B11/14
Abstract:
A focus monitor on an alternating phase shift mask may include sub-wavelength features which have a depth corresponding to an etch depth of primary features on the mask (e.g., a 180° etch depth), but which produce an effective phase shift of about 60° to 120°.
Public/Granted literature
- US20040234869A1 Image focus monitor for alternating phase shift masks Public/Granted day:2004-11-25
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