Invention Grant
- Patent Title: Method for removing impurities from porous materials
- Patent Title (中): 从多孔材料中去除杂质的方法
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Application No.: US11023437Application Date: 2004-12-29
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Publication No.: US07124764B2Publication Date: 2006-10-24
- Inventor: Kon-Tsu Kin , Chiou-Mei Chen , Pei-Lin Chang , Hsiao-Fen Cheng
- Applicant: Kon-Tsu Kin , Chiou-Mei Chen , Pei-Lin Chang , Hsiao-Fen Cheng
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Bacon & Thomas, PLLC
- Main IPC: B08B9/00
- IPC: B08B9/00

Abstract:
The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.
Public/Granted literature
- US20060137718A1 Method for removing impurities from porous materials Public/Granted day:2006-06-29
Information query
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