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公开(公告)号：US20060137718A1
公开(公告)日：2006-06-29
申请号：US11023437
申请日：2004-12-29
Applicant: Kon-Tsu Kin , Chiou-Mei Chen , Pei-Lin Chang , Hsiao-Fen Cheng
Inventor： Kon-Tsu Kin , Chiou-Mei Chen , Pei-Lin Chang , Hsiao-Fen Cheng
IPC: B08B9/00
CPC classification number: B08B7/0021 , B82Y30/00 , F26B21/14
Abstract: The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.
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公开(公告)号：US07124764B2
公开(公告)日：2006-10-24
申请号：US11023437
申请日：2004-12-29
Applicant: Kon-Tsu Kin , Chiou-Mei Chen , Pei-Lin Chang , Hsiao-Fen Cheng
Inventor： Kon-Tsu Kin , Chiou-Mei Chen , Pei-Lin Chang , Hsiao-Fen Cheng
IPC: B08B9/00
CPC classification number: B08B7/0021 , B82Y30/00 , F26B21/14
Abstract: The present invention discloses a method for removing impurities from a porous material by flowing a supercritical fluid with or without a modifier therein over a to-be-cleaned porous material having pores at the nanometer level under suitable temperatures and pressures, so that the supercritical fluid migrates into the pores at the nanometer level and removes impurities entrapped therein. The method of the present invention uses the physical and chemical properties of the supercritical fluid and optionally the modifier to clean the porous material without using an acid or alkaline solvent. The method of the present invention conserves water, and is both a highly efficient and environmentally friendly cleaning technique.
Abstract translation: 本发明公开了一种通过使具有或不具有改性剂的超临界流体在适当的温度和压力下在具有纳米级的孔的待清洁的多孔材料中流过多孔材料来除去杂质的方法，使得超临界流体 迁移到纳米级的孔中，去除夹在其中的杂质。 本发明的方法使用超临界流体和任选的改性剂的物理和化学性质来清洁多孔材料而不使用酸或碱溶剂。 本发明的方法节约了水，同时也是高效和环保的清洗技术。
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公开(公告)号：US20050263458A1
公开(公告)日：2005-12-01
申请号：US10852166
申请日：2004-05-25
Applicant: Kon-Tsu Kin , Pei-Lin Chang , Farhang Shadman , Hsiao-Fen Cheng
Inventor： Kon-Tsu Kin , Pei-Lin Chang , Farhang Shadman , Hsiao-Fen Cheng
CPC classification number: C02F9/00 , C02F1/20 , C02F1/32 , C02F1/42 , C02F1/78 , C02F2103/04 , C02F2301/046 , C02F2301/08 , Y10S210/90
Abstract: In order to reduce a total organic carbon (TOC) in ultrapure water to a level less than 1 ppb, several cycles of ozone contact/UV irradiation treatments are carried out in sequence. Preferably, the first cycle further includes an ion exchange treatment which is applied to the resulting UV irradiation water.
Abstract translation: 为了将超纯水中的总有机碳（TOC）降低至低于1ppb的水平，进行几次臭氧接触/ UV照射处理。 优选地，第一循环还包括施加到所得UV照射水的离子交换处理。
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公开(公告)号：US06991733B2
公开(公告)日：2006-01-31
申请号：US10852166
申请日：2004-05-25
Applicant: Kon-Tsu Kin , Pei-Lin Chang , Farhang Shadman , Hsiao-Fen Cheng
Inventor： Kon-Tsu Kin , Pei-Lin Chang , Farhang Shadman , Hsiao-Fen Cheng
CPC classification number: C02F9/00 , C02F1/20 , C02F1/32 , C02F1/42 , C02F1/78 , C02F2103/04 , C02F2301/046 , C02F2301/08 , Y10S210/90
Abstract: In order to reduce a total organic carbon (TOC) in ultrapure water to a level less than 1 ppb, several cycles of ozone contact/UV irradiation treatments are carried out in sequence. Preferably, the first cycle further includes an ion exchange treatment which is applied to the resulting UV irradiation water.
Abstract translation: 为了将超纯水中的总有机碳（TOC）降低至低于1ppb的水平，进行几次臭氧接触/ UV照射处理。 优选地，第一循环还包括施加到所得UV照射水的离子交换处理。
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