Invention Grant
- Patent Title: Gated electron emitter having supported gate
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Application No.: US11213597Application Date: 2005-08-26
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Publication No.: US07140942B2Publication Date: 2006-11-28
- Inventor: Charlie C. Hong, deceased
- Applicant: Randolph D. Schueller , Susan Hong, legal representative
- Applicant Address: US CA San Jose
- Assignee: Altera Corporation
- Current Assignee: Altera Corporation
- Current Assignee Address: US CA San Jose
- Agency: Martine Penilla & Gencarella, LLP
- Main IPC: H01J9/02
- IPC: H01J9/02 ; H01J1/304

Abstract:
A field emission device having emitter tips and a support layer for a gate electrode is provided. Openings in the support layer and the gate layer are sized to provide mechanical support for the gate electrode. Cavities may be formed and mechanically supported by walls between cavities or columns within a cavity. Dielectric layers having openings of different sizes between the emission tips and the gate electrode can decrease leakage current between emitter tips and the gate layer. The emitter tips may comprise a carbon-based material. The device can be formed using processing operations similar to those used in conventional semiconductor device manufacturing.
Public/Granted literature
- US20060003662A1 Gated electron emitter having supported gate Public/Granted day:2006-01-05
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