Invention Grant
US07241475B2 Method for producing carbon surface films by plasma exposure of a carbide compound
有权
通过碳化物化合物的等离子体暴露来生产碳表面膜的方法
- Patent Title: Method for producing carbon surface films by plasma exposure of a carbide compound
- Patent Title (中): 通过碳化物化合物的等离子体暴露来生产碳表面膜的方法
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Application No.: US10954455Application Date: 2004-09-30
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Publication No.: US07241475B2Publication Date: 2007-07-10
- Inventor: Gouri Radhakrishnan
- Applicant: Gouri Radhakrishnan
- Applicant Address: US CA El Segundo
- Assignee: The Aerospace Corporation
- Current Assignee: The Aerospace Corporation
- Current Assignee Address: US CA El Segundo
- Agent Derrick Michael Reid
- Main IPC: C23C16/02
- IPC: C23C16/02 ; C23C16/32 ; H05H1/24
Abstract:
Reactive halogen-ion plasmas, having for example, generating chloride ions, generated from low-pressure halogen gases using a radio-frequency plasma are employed for producing low-friction carbon coatings, such as a pure carbon film, at or near room temperature on a bulk or thin film of a compound, such as titanium carbide.
Public/Granted literature
- US20060068125A1 Method for producing carbon surface films by plasma exposure of a carbide compound Public/Granted day:2006-03-30
Information query
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