Invention Grant
- Patent Title: Gauge calibration method
- Patent Title (中): 仪表校准方法
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Application No.: US11210419Application Date: 2005-08-24
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Publication No.: US07263870B2Publication Date: 2007-09-04
- Inventor: Cesar Avitia , Martin Joel Ibarra , Raul Antonio Rascon
- Applicant: Cesar Avitia , Martin Joel Ibarra , Raul Antonio Rascon
- Applicant Address: US MI Van Buren Township
- Assignee: Visteon Global Technologies, Inc.
- Current Assignee: Visteon Global Technologies, Inc.
- Current Assignee Address: US MI Van Buren Township
- Agency: Brinks Hofer Gilson & Lione
- Main IPC: G01D18/00
- IPC: G01D18/00 ; G01D11/28

Abstract:
The instrument panel gauge assembly includes an applique having gauge graphics printed thereon and a needle pointer for a gauge assembly positioned adjacent thereto. A transparent chaplet is formed within the applique to allow light to pass through. The needle passes over the chaplet as the needle moves. When the needle is positioned directly in front of the chaplet, light is blocked from passing through the chaplet. A light sensing element is positioned behind the applique to detect the presence of light passing through the chaplet. A light baffle guides light passing through the chaplet to the light sensing element. A controller receives a signal from the light sensing element indicating when the needle pointer is directly in front of the chaplet. The controller then compares the actual input to the gauge with the position of the needle pointer, calculates a correction factor, and calibrates the gauge accordingly.
Public/Granted literature
- US20070044535A1 Gauge calibration method Public/Granted day:2007-03-01
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