Invention Grant
- Patent Title: Polishing pad with window
- Patent Title (中): 抛光垫与窗口
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Application No.: US10669544Application Date: 2003-09-23
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Publication No.: US07264536B2Publication Date: 2007-09-04
- Inventor: Andreas Norbert Wiswesser , Ramiel Oshana , Kerry F. Hughes , Jay Rohde , David Datong Huo , Dominic J. Benvegnu
- Applicant: Andreas Norbert Wiswesser , Ramiel Oshana , Kerry F. Hughes , Jay Rohde , David Datong Huo , Dominic J. Benvegnu
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson
- Main IPC: B24B49/12
- IPC: B24B49/12
Abstract:
A polishing layer of a polishing has a window member with a top surface positioned a predetermined distance below the polishing surface. A transparent layer can be positioned below the polishing layer and supporting the window member.
Public/Granted literature
- US20050064802A1 Polishing pad with window Public/Granted day:2005-03-24
Information query
