Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
-
Application No.: US10964816Application Date: 2004-10-15
-
Publication No.: US07352435B2Publication Date: 2008-04-01
- Inventor: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
- Applicant: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
- Applicant Address: NL Veldhoven DE Oberkochen
- Assignee: ASML Netherlands B.V.,Carl Zeiss SMT AG
- Current Assignee: ASML Netherlands B.V.,Carl Zeiss SMT AG
- Current Assignee Address: NL Veldhoven DE Oberkochen
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: EP03256498 20031015
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52
Abstract:
In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Public/Granted literature
- US20050174550A1 Lithographic apparatus and device manufacturing method Public/Granted day:2005-08-11
Information query
