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公开(公告)号：US08780325B2
公开(公告)日：2014-07-15
申请号：US12635933
申请日：2009-12-11
CPC classification number: G03F7/70266 , G03B27/54 , G03F7/70308 , G03F7/70525 , G03F7/70833 , G03F7/70891
Abstract: In an embodiment, there is provided a method of at least partially compensating for a deviation in a property of a pattern feature to be applied to a substrate using a lithographic apparatus. The method includes determining a desired phase change to be applied to at least a portion of a radiation beam that is to be used to apply the pattern feature to the substrate and which would at least partially compensate for the deviation in the property. The determination of the desired phase change includes determining a desired configuration of a phase modulation element. The method further includes implementing the desired phase change to the portion of the radiation beam when applying the pattern feature to the substrate, the implementation of the desired phase change comprising illuminating the phase modulation element with the portion of the radiation beam when the phase modulation element is in the desired configuration.
Abstract translation: 在一个实施例中，提供了一种至少部分地补偿使用光刻设备施加到基板的图案特征的特性的偏差的方法。 该方法包括确定要应用于要用于将图案特征应用于衬底的辐射束的至少一部分的期望相位变化，并且将至少部分地补偿该特性的偏差。 所需相位变化的确定包括确定相位调制元件的期望配置。 该方法还包括当将图案特征应用于衬底时，实现对辐射束的该部分的期望的相位变化，所述相位变化的实现包括当相位调制元件 处于所需的配置。
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公开(公告)号：US08612045B2
公开(公告)日：2013-12-17
申请号：US12633252
申请日：2009-12-08
Applicant: Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
Inventor： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
Abstract: Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
Abstract translation: 记录双重图案化平版印刷工艺中的每个步骤中的变量，并测量双重图案化工艺中的中间特征的特征。 然后对最终特征进行建模，并优化变量的值。
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3.再颁专利Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby 有权平版印刷制造工艺，光刻投影装置和由此制造的装置公开(公告)号：USRE43643E1
公开(公告)日：2012-09-11
申请号：US11524497
申请日：2006-09-21
Applicant: Jozef Maria Finders
Inventor： Jozef Maria Finders
CPC classification number: G03F7/70558 , G03F7/70458 , G03F7/70625 , G03F7/70991
Abstract: A lithographic manufacturing process is disclosed in which first information of a lithographic transfer function of a first lithographic projection apparatus is obtained. The information is compared with second information of a reference lithographic transfer function (e.g. of a second lithographic projection apparatus). The difference between the first and second information is calculated. Then, the change of machine settings for the first lithographic projection apparatus, needed to minimize the difference, is calculated and applied to the first lithographic projection apparatus. In an exemplary application, a match between the first and second lithographic projection apparatus of any pitch-dependency of feature errors is improved.
Abstract translation: 公开了获得第一光刻投影装置的光刻传递函数的第一信息的光刻制造工艺。 将信息与参考光刻传递函数（例如，第二光刻投影装置）的第二信息进行比较。 计算第一和第二信息之间的差异。 然后，计算第一光刻投影装置的最小化差异所需的用于第一光刻投影装置的机器设置的改变并将其应用于第一光刻投影装置。 在示例性应用中，提高了第一和第二光刻投影设备之间与特征误差的任何音调依赖性的匹配。
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公开(公告)号：US08164741B2
公开(公告)日：2012-04-24
申请号：US13103551
申请日：2011-05-09
Applicant: Jozef Maria Finders
Inventor： Jozef Maria Finders
CPC classification number: G03F7/70891 , G03F7/70258 , G03F7/70308
Abstract: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.
Abstract translation: 光刻设备包括相位调节器，用于在曝光基板上的图案时调节穿过相位调节器的光学元件的光波的相位。 在一个实施例中，光学元件是光刻设备的投影系统中的热可控光学元件。 在使用中，用包括离轴辐射束的照明模式照亮图案。 该光束被衍射成相对于光轴相对和不对称倾斜的零级和一级衍射光束。 识别出一级衍射光束穿过光学元件的区域。 通过相对于零级衍射光束的光学相位计算一级衍射光束的期望的光学相位来优化图案的图像的图像特性。 控制相位调节器以将期望的光学相位施加到一阶衍射光束。
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公开(公告)号：US20100310836A1
公开(公告)日：2010-12-09
申请号：US12760983
申请日：2010-04-15
CPC classification number: G03F7/70641 , G03F7/40 , G03F7/70533 , H01L21/0274 , H01L21/0337 , H01L21/0338
Abstract: A lithographic method includes exposing a first layer of material to a radiation beam to form a first pattern feature in the first layer, the first pattern feature having sidewalls, and a focal property of the radiation beam being controlled to control a sidewall angle of the sidewalls; providing a second layer of material over the first pattern feature to provide a coating on sidewalls of the first pattern; removing a portion of the second layer, leaving a coating of the second layer of material on sidewalls of the first pattern; removing the first pattern formed from the first layer, leaving on the substrate at least a part of the second layer that formed a coating on sidewalls of that first pattern, the part of the second layer left forming second pattern features in locations adjacent to the locations of sidewalls of the removed first pattern feature.
Abstract translation: 光刻方法包括将第一层材料暴露于辐射束以在第一层中形成第一图案特征，第一图案特征具有侧壁，并且辐射束的焦点特性被控制以控制侧壁的侧壁角 ; 在所述第一图案特征上提供第二层材料以在所述第一图案的侧壁上提供涂层; 去除所述第二层的一部分，在所述第一图案的侧壁上留下所述第二材料层的涂层; 去除由第一层形成的第一图案，在衬底上留下在第一图案的侧壁上形成涂层的第二层的至少一部分，第二层的部分在与位置相邻的位置中形成第二图案 的去除的第一图案特征的侧壁。
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Patent Agency Ranking
6.发明授权Method of patterning a positive tone resist layer overlaying a lithographic substrate 有权图案化叠加光刻基板的正色调抗蚀剂层的方法公开(公告)号：US07811746B2
公开(公告)日：2010-10-12
申请号：US11527732
申请日：2006-09-27
Applicant: Jozef Maria Finders
Inventor： Jozef Maria Finders
CPC classification number: G03F7/70466 , G03F1/36 , G03F1/70 , G03F7/70433
Abstract: A single exposure method and a double exposure method for reducing mask error factor and for enhancing lithographic printing-process resolution is presented. The invention comprises decomposing a desired pattern of dense lines and spaces in two sub patterns of semi-dense spaces that are printed in interlaced position with respect to each other, using positive tone resist. Each of the exposures is executed after applying a relative space-width widening to the spaces of two corresponding patterning device patterns of semi-dense spaces. A factor representative for the space-width widening has a value between 1 and 3, thereby reducing mask error factor and line edge roughness.
Abstract translation: 提出了一种减少掩模误差因子和增强平版印刷工艺分辨率的单一曝光方法和双曝光方法。 本发明包括使用正色调抗蚀剂分解以相互间隔开的位置打印的半密度空间的两个子图案中的所需图案的致密线和空间。 在将相对空间宽度加宽到半密集空间的两个对应的图案形成装置图案的空间之后执行每个曝光。 代表空间宽度加宽的因子具有1到3之间的值，从而减少掩模误差因子和线边缘粗糙度。
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公开(公告)号：US20090296060A1
公开(公告)日：2009-12-03
申请号：US12476044
申请日：2009-06-01
Applicant: Jozef Maria Finders
Inventor： Jozef Maria Finders
CPC classification number: G03F7/70891 , G03F7/70258 , G03F7/70308
Abstract: A lithographic apparatus includes a phase adjuster to adjust a phase of an optical wave traversing an optical element of the phase adjuster during exposure of a pattern on a substrate. In an embodiment, the optical element is a heat controllable optical element in a projection system of the lithographic apparatus. In use, the pattern is illuminated with an illumination mode including an off-axis radiation beam. This beam is diffracted into zeroth-order and first-order diffracted beams oppositely and asymmetrically inclined with respect to an optical axis. An area is identified where the first-order diffracted beam traverses the optical element. An image characteristic of an image of the pattern is optimized by calculating a desired optical phase of the first-order diffracted beam in relation to the optical phase of the zeroth-order diffracted beam. The phase adjuster is controlled to apply the desired optical phase to the first order diffracted beam.
Abstract translation: 光刻设备包括相位调节器，用于在曝光基板上的图案时调节穿过相位调节器的光学元件的光波的相位。 在一个实施例中，光学元件是光刻设备的投影系统中的热可控光学元件。 在使用中，用包括离轴辐射束的照明模式照亮图案。 该光束被衍射成相对于光轴相对和不对称倾斜的零级和一级衍射光束。 识别出一级衍射光束穿过光学元件的区域。 通过相对于零级衍射光束的光学相位计算一级衍射光束的期望的光学相位来优化图案的图像的图像特性。 控制相位调节器以将期望的光学相位施加到一阶衍射光束。
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公开(公告)号：US20090190115A1
公开(公告)日：2009-07-30
申请号：US12392744
申请日：2009-02-25
CPC classification number: G03F7/70333 , G03F7/70425
Abstract: A method for exposing a resist layer on a substrate to an image of a pattern on a mask is disclosed whereby, after starting exposure and before completing exposure, a controlled amount of contrast loss is introduced by a controller in the image at the resist layer by changing during exposure the position of the substrate holder. The contrast loss affects the pitch dependency of the resolution of a lithographic projection apparatus, and its control is used to match pitch dependency of resolution between different lithographic projection apparatus.
Abstract translation: 公开了一种用于将基板上的抗蚀剂层暴露于掩模上的图案的图像的方法，其中，在开始曝光之后并且在完成曝光之前，控制器通过控制器在抗蚀剂层的图像中引入受控量的对比度损失 在曝光期间改变衬底保持器的位置。 对比度损耗影响光刻投影设备的分辨率的音调依赖性，并且其控制用于匹配不同光刻投影设备之间的分辨率的音调依赖性。
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公开(公告)号：US07352435B2
公开(公告)日：2008-04-01
申请号：US10964816
申请日：2004-10-15
Applicant: Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Graeupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
CPC classification number: G03F7/70341 , G03F7/70333
Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Abstract translation: 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
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10.发明授权Device manufacturing method, computer program product and lithographic apparatus 有权设备制造方法，计算机程序产品和光刻设备公开(公告)号：US07307690B1
公开(公告)日：2007-12-11
申请号：US11642984
申请日：2006-12-21
IPC: G03B27/42
CPC classification number: G03B27/42 , G03F7/70258 , G03F7/705
Abstract: A method of optimizing adjustable settings of adjustable elements of a projection system in a lithographic apparatus is disclosed that includes determining an object spectrum for a pattern and an illumination arrangement, determining a symmetry of the object spectrum, constructing a merit function for a wave-front in a pupil plane of the projection system with the settings of the adjustable elements as variables with reference to the symmetry, and optimizing the merit function.
Abstract translation: 公开了一种优化光刻设备中的投影系统的可调节元件的可调整设置的方法，其包括确定图案和照明布置的物体光谱，确定物体光谱的对称性，构建波前的优值函数 在投影系统的瞳孔平面中，可调节元素的设置作为参考对称性的变量，并优化功能函数。
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