Invention Grant
- Patent Title: Projection optical system and exposure apparatus having the same
- Patent Title (中): 投影光学系统和具有相同的曝光装置
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Application No.: US11282418Application Date: 2005-11-17
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Publication No.: US07403262B2Publication Date: 2008-07-22
- Inventor: Yuhei Sumiyoshi
- Applicant: Yuhei Sumiyoshi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Morgan & Finnegan, LLP
- Priority: JP2004-335192 20041118
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/54
Abstract:
A projection optical system used for an exposure apparatus to projecting a reduced size of an image of an object onto an image plane includes plural refractive elements that dispense with a reflective element having a substantial optical power, wherein the projection optical system forms an intermediate image.
Public/Granted literature
- US20060126048A1 Projection optical system and exposure apparatus having the same Public/Granted day:2006-06-15
Information query
